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   A new concept of enhanced-mode GaN HEMT using fluorine implantation in the GaN layer   [View] 
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 Author(s)   Saleem HAMADY, Frederic MORANCHO, Bilal BEYDOUN, Patrick AUSTIN, Mathieu GAVELLE 
 Abstract   In this paper, a new concept of normally-off HEMT is proposed: it uses for the first time the implantation of Fluorine ions in the GaN layer below the AlGaN/GaN interface rather than in the AlGaN layer. Simulation results show that the proposed method is more effective when it comes to the Fluorine concentration required to achieve normally-off operation. 
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Filename:0260-epe2013-full-15183985.pdf
Filesize:238.3 KB
 Type   Members Only 
 Date   Last modified 2014-02-09 by System