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Space-saving edge-termination structures for vertical charge compensation devices
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| Author(s) |
Ralf SIEMIENIEC, Christian GEISSLER, Franz HIRLER |
| Abstract |
High efficiency is one of the major requirements of today’s modern power architectures. To achieve the needs of modern power topologies, advanced power device designs are essential. In the field of low-voltage devices, covering a range up to 250 V, a significant reduction of the MOSFET on-resistance is achieved by employing the compensation principle based on field-plates. Such devices do require new design techniques. Advanced edge-termination structures enable high blocking voltages exceeding 100 V. This work proposes different edge-termination structures and shows first results and benchmarks of manufactured devices from this new MOSFET design generation. |
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| Filename: | 0159-epe2009-full-10573742.pdf |
| Filesize: | 1.909 MB |
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| Type |
Members Only |
| Date |
Last modified 2010-01-27 by System |
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